Instrument Specification
The Dimension Edge Atomic Force Microscope
This technology provides the highest levels of performance, functionality, and accessibility in its class.
Based on the Dimension Icon® platform, the Edge system has been designed from top to bottom to deliver the low drift and
low noise necessary to achieve publication-ready data in minutes instead of hours.
ScanAsyst imaging, integrated visual feedback, and preconfigured settings enable expert-level results simply and consistently, making the most advanced large-sample atomic force microscopy capabilities and techniques available to every user.
Specifications:
- X-Y Scan Range: 90μm x 90μm typical, 85μm minimum
- Z Range: 10μm typical in imaging and force ramp modes, 9.5μm minimum
- Vertical Noise Floor: <50pm RMS inappropriate environment, typical imaging bandwidth (up to 625Hz)
- XY Position Sensor Noise Level (Closed Loop): <0.5nm RMS typical imaging bandwidth (up to 625Hz)
- Z Position Sensor Noise Level (Closed Loop): <0.2nm RMS typical imaging bandwidth (up to 625Hz)
- Sample/Size/Holder:150mm vacuum chuck, 15mm thick.
Up to 40mm thick with optional frame spacer. - Motorized Positioning Stage (X-Y axis): 150mm x 150mm inspectable area.
Programmable for multi-site measurements - Microscope Optics: 5-megapixel digital camera.
180μm to 1465μm viewing area.
Digital zoom and motorized focus. - Signal Access: Configurable I/O signal access is built into the controller.
Includes customizable signal routing, digital feedback, and dual digital lock-in - Single Point Spectroscopy: Three-axis closed-loop control for point-and-shoot positioning and ramping.
Spring constant calibration with a built-in thermal tune.
AFM available Modes
Contact Mode, Peak Force Tapping, TappingMode, PhaseImaging, Nanolithography (Scratching), Force Spectroscopy, Adhesion, ScanAsyst.
Unavailable modes:
Listed below are modes that can be considered for purchase on request.
Scanning Tunneling Microscopy, Conductive AFM, Tunneling AFM, Scanning Capacitance Microscopy, Surface Potential Microscopy, Piezoresponse Microscopy, Nanolithography (Anodic oxidation).
Location
Staff Contacts
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Dr. Ora Simcha Bitton Israel
Staff Scientist
Training information
Qualification duration depends on user experience and sample measurement constraints, as a result, this can take one full day or more.