Organic evaporator system designed for vacuum deposition and thin film growth applications. The purpose of such an instrument is to deposit thin films of organic materials, onto substrates in a controlled and precise manner.
The key specifications and features of the quoted Nexdep Base System include:

1. Vacuum Chamber: 400 mm W × 400 mm D × 500 mm H aluminum vacuum chamber with a hinged door and viewport for easy access and monitoring.
2. System Control with Aeres: PC control station with Windows 10 Professional and Angstrom Aeres software for unified machine and deposition control, providing complete control over the deposition process, recipe management, and automation.
3. Vacuum Pumping Package: Pfeiffer Hi-Pace 700 hybrid bearing turbo pump with a pumping speed of 685 l/s for N2 and an Agilent 9cfm TriScroll Dry Pump.
4. Pressure Measurement: Inficon MPG 400 full-range vacuum sensor for wide measurement range from 5E-8 Torr to atmosphere.
5. Deposition Source: RADAK I evaporation source with a 2 cc crucible and a temperature range of ambient to 600 °C, controllable via temperature or deposition rate.
6. Quartz Crystal Microbalance (QCM) Deposition Rate Sensor: Water-cooled sensor for accurate rate monitoring.
7. Rotating Substrate Stage: Tapped sample holder designed for 100 mm x 100 mm substrates with continuous rotation capability of 10 - 30 RPM.
8. Backside Substrate Heating: Temperature control from ambient to 100 °C with multi-stage heat shield design and PID-based temperature control. Other features include a source shutter, split 2-piece substrate shutter, a Lytron water cooling system, and a moisture flow package for water vapor deposition.