- Qualitative phase analysis, including automatic search/match using PDF-4+ database (ICDD);
- Quantitative phase analysis, including evaluation of the degree of crystallinity;
- Lattice parameter evaluation (precise positioning of the sample is required);
- Determination of microstrain and evaluation of crystallite size (coherent scattering length < 300 nm);
- Crystal structure refinement by the Pawley method;
- Texture determination using pole figure mapping;
- Residual stress measurement;
- Reciprocal space mapping;
- Thin film reflectivity for thickness, density and estimation of surface roughness;
- High-resolution measurements using a Ge (220) 2-bounce monochromator and analyzer;
- Ge (220) 4-bounce monochromator providing single wavelength (Ka1 ) X-rays;
- Capillary sample holders for materials that require a controlled environment and/or materials with severe preferential orientation on flat plate sample holders;
- Diffraction measurements on materials maintained in the temperature range: -180° to 300°C;
- Diffraction measurements on materials maintained in the temperature range: ambient to 1000°C;
- Measurements under vacuum (10-2 mbar) or in a specified gas atmosphere (e.g. N2, He)
- Wide angle and small angle X-ray scattering – (WAXS / SAXS)- in transmission, using a high- resolution 2-dimensional solid state detector;
- In-plane measurements for textured thin films;
- Surface mapping to determine structure heterogeneity;
- Powdered samples can be measured in reflection on zero-background Si or quartz plates.