Methods

  • Qualitative phase analysis, including automatic search/match using PDF-4+ database (ICDD); 
  • Quantitative phase analysis, including evaluation of the degree of crystallinity; 
  • Lattice parameter evaluation (precise positioning of the sample is required); 
  • Determination of microstrain and evaluation of crystallite size (coherent scattering length < 300 nm); 
  • Crystal structure refinement by the Pawley method; 
  • Texture determination using pole figure mapping; 
  • Residual stress measurement; 
  • Reciprocal space mapping; 
  • Thin film reflectivity for thickness, density and estimation of surface roughness; 
  • High-resolution measurements using a Ge (220) 2-bounce monochromator and analyzer; 
  • Ge (220) 4-bounce monochromator providing single wavelength (Ka1 ) X-rays; 
  • Capillary sample holders for materials that require a controlled environment and/or materials with severe preferential orientation on flat plate sample holders; 
  • Diffraction measurements on materials maintained in the temperature range: -180° to 300°C; 
  • Diffraction measurements on materials maintained in the temperature range: ambient to  1000°C; 
  • Measurements under vacuum (10-2 mbar) or in a specified gas atmosphere (e.g. N2, He) 
  • Wide angle and small angle X-ray scattering – (WAXS / SAXS)- in transmission, using a high- resolution 2-dimensional  solid state detector; 
  • In-plane measurements for textured thin films; 
  • Surface mapping to determine structure heterogeneity; 
  • Powdered samples can be measured in reflection on zero-background Si or quartz plates.